Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces

X - Ray Photoelectron Spectroscopy of Silicate Glasses

X-ray photoelectron spectroscopy (XPS) is a powerful technique capable of providing unique information about the structural chemistry of glasses. However, inappropriate procedures for the preparation of sample surfaces or the lack of reliable methods to overcome electrostatic charging effects during analysis of dielectric materials can cause spurious features to be introduced or intrinsic featu...

X-ray Standing Wave at the Total Reflection Condition

Fresnel theory is used to derive the complex electric fields above and 7 below an X-ray– reflecting interface that separates two materials with 8 differing refraction indices. The interference between the incident and 9 reflected waves produces an X-ray standing wave (XSW) above the 10 reflecting interface. The XSW intensity modulation is strongly enhanced 11 by the total external reflection co...

An Angle-Resolved Photoelectron Spectroscopy and Near-Edge X-ray Absorption Fine Structure Study

The nature of the surface formed by a saturated layer (8(NO) = 1.0) of NO on a Mo(100) surface at 150 K has been determined by using both angle-resolved ultraviolet photoelectron spectroscopy and the angular variation of near-edge X-ray absorption fine structure (NEXAFS). Photoelectron spectroscopy indicates that NO can adsorb molecularly at this temperature but that a portion of the NO is also...

Investigation of solid/vapor interfaces using ambient pressure X-ray photoelectron spectroscopy.

Heterogeneous chemical reactions at vapor/solid interfaces play an important role in many processes in the environment and technology. Ambient pressure X-ray photoelectron spectroscopy (APXPS) is a valuable tool to investigate the elemental composition and chemical specificity of surfaces and adsorbates on the molecular scale at pressures of up to 130 mbar. In this review we summarize the histo...

Reactive ZnO/Ti/ZnO interfaces studied by hard x-ray photoelectron spectroscopy